| Multilayer interconnect structure containing air gaps and method for making KE Babich, RA Carruthers, TJ Dalton, A Grill, JC Hedrick, CV Jahnes, ... US Patent 6,815,329, 2004 | 166 | 2004 |
| FinFET performance advantage at 22nm: An AC perspective M Guillorn, J Chang, A Bryant, N Fuller, O Dokumaci, X Wang, J Newbury, ... 2008 Symposium on VLSI Technology, 12-13, 2008 | 123 | 2008 |
| Antireflective SiO-containing compositions for hardmask layer D Pfeiffer, M Angelopoulos, K Babich, P Brock, WS Huang, ... US Patent 6,730,454, 2004 | 120* | 2004 |
| Tunabale vapor deposited materials as antireflective coatings, hardmasks and as combined antireflective coating/hardmasks and methods of fabrication thereof and application thereof M Angelopoulos, K Babich, A Grill, SD Halle, AP Mahorowala, VV Patel US Patent 6,316,167, 2001 | 116 | 2001 |
| Tunable vapor deposited materials as antireflective coatings, hardmasks and as combined antireflective coating/hardmasks and methods of fabrication thereof and applications thereof M Angelopoulos, K Babich, A Grill, SD Halle, AP Mahorowala, VV Patel US Patent 6,514,667, 2003 | 97 | 2003 |
| Tunable and removable plasma deposited antireflective coatings KE Babich, AC Callegari, J Fontaine, A Grill, CV Jahnes, VV Patel US Patent 6,428,894, 2002 | 97 | 2002 |
| SrHfO3 as gate dielectric for future CMOS technology C Rossel, M Sousa, C Marchiori, J Fompeyrine, D Webb, D Caimi, ... Microelectronic engineering 84 (9-10), 1869-1873, 2007 | 88 | 2007 |
| Demonstration of highly scaled FinFET SRAM cells with high-κ/metal gate and investigation of characteristic variability for the 32 nm node and beyond H Kawasaki, M Khater, M Guillorn, N Fuller, J Chang, S Kanakasabapathy, ... 2008 IEEE International Electron Devices Meeting, 1-4, 2008 | 77 | 2008 |
| Optical properties of epitaxial SrHfO3 thin films grown on Si M Sousa, C Rossel, C Marchiori, H Siegwart, D Caimi, JP Locquet, ... Journal of Applied Physics 102 (10), 2007 | 76 | 2007 |
| Investigation of FinFET devices for 32nm technologies and beyond H Shang, L Chang, X Wang, M Rooks, Y Zhang, B To, K Babich, G Totir, ... 2006 Symposium on VLSI Technology, 2006. Digest of Technical Papers., 54-55, 2006 | 76 | 2006 |
| Multilayer interconnect structure containing air gaps and method for making KE Babich, RA Carruthers, TJ Dalton, A Grill, JC Hedrick, CV Jahnes, ... US Patent 7,098,476, 2006 | 74 | 2006 |
| Stabilization of fluorine-containing low-k dielectrics in a metal/insulator wiring structure by ultraviolet irradiation K Babich, A Callegari, SA Cohen, A Grill, CV Jahnes, VV Patel, ... US Patent 6,448,655, 2002 | 60 | 2002 |
| Silicon containing polymer in applications for 193-nm high-NA lithography processes S Burns, D Pfeiffer, A Mahorowala, K Petrillo, A Clancy, K Babich, ... Advances in Resist Technology and Processing XXIII 6153, 201-212, 2006 | 50 | 2006 |
| Multifunctional polymeric materials and use thereof M Angelopoulos, KE Babich, DR Medeiros, WM Moreau US Patent 6,686,124, 2004 | 43 | 2004 |
| Filling narrow openings using ion beam etch KE Babich, AC Callegari, CD Sheraw, EJ O'sullivan US Patent 8,497,212, 2013 | 35 | 2013 |
| Hardmask technology for sub-100-nm lithographic imaging K Babich, AP Mahorowala, DR Medeiros, D Pfeiffer, KE Petrillo, ... Advances in Resist Technology and Processing XX 5039, 152-165, 2003 | 34 | 2003 |
| High-resolution 248-nm bilayer resist Q Lin, KE Petrillo, K Babich, DC LaTulipe, DR Medeiros, AP Mahorowala, ... Advances in Resist Technology and Processing XVI 3678, 241-250, 1999 | 34 | 1999 |
| Techniques for patterning features in semiconductor devices SD Allen, KE Babich, SJ Holmes, AP Mahorowala, D Pfeiffer, RS Wise US Patent 7,545,041, 2009 | 33 | 2009 |
| Lithographic antireflective hardmask compositions and uses thereof K Babich, AP Mahorowala, DR Medeiros, D Pfeiffer US Patent 7,223,517, 2007 | 32 | 2007 |
| Antireflective hardmask and uses thereof K Babich, E Huang, AP Mahorowala, DR Medeiros, D Pfeiffer, K Temple US Patent 7,172,849, 2007 | 32 | 2007 |
