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Bastien Bruneau
Bastien Bruneau
Verified email at polytechnique.edu
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Cited by
Year
Strong ionization asymmetry in a geometrically symmetric radio frequency capacitively coupled plasma induced by sawtooth voltage waveforms
B Bruneau, T Gans, D O’Connell, A Greb, EV Johnson, JP Booth
Physical review letters 114 (12), 125002, 2015
1232015
Electron power absorption dynamics in capacitive radio frequency discharges driven by tailored voltage waveforms in CF4
S Brandt, B Berger, E Schüngel, I Korolov, A Derzsi, B Bruneau, ...
Plasma Sources Science and Technology 25 (4), 045015, 2016
642016
Ion flux asymmetry in radiofrequency capacitively-coupled plasmas excited by sawtooth-like waveforms
B Bruneau, T Novikova, T Lafleur, JP Booth, EV Johnson
Plasma Sources Science and Technology 23 (6), 065010, 2014
632014
Effect of gas properties on the dynamics of the electrical slope asymmetry effect in capacitive plasmas: comparison of Ar, H2 and CF4
B Bruneau, T Lafleur, T Gans, D O’Connell, A Greb, I Korolov, A Derzsi, ...
Plasma Sources Science and Technology 25 (1), 01LT02, 2015
522015
Control and optimization of the slope asymmetry effect in tailored voltage waveforms for capacitively coupled plasmas
B Bruneau, T Novikova, T Lafleur, JP Booth, EV Johnson
Plasma Sources Science and Technology 24 (1), 015021, 2014
472014
Power coupling mode transitions induced by tailored voltage waveforms in capacitive oxygen discharges
A Derzsi, B Bruneau, AR Gibson, E Johnson, D O’Connell, T Gans, ...
Plasma Sources Science and Technology 26 (3), 034002, 2017
402017
Tailored voltage waveform capacitively coupled plasmas in electronegative gases: frequency dependence of asymmetry effects
E Schüngel, I Korolov, B Bruneau, A Derzsi, E Johnson, D O’Connell, ...
Journal of Physics D: Applied Physics 49 (26), 265203, 2016
312016
Growth mechanisms study of microcrystalline silicon deposited by SiH4/H2 plasma using tailored voltage waveforms
B Bruneau, J Wang, JC Dornstetter, EV Johnson
Journal of Applied Physics 115 (8), 2014
292014
Controlling the shape of the ion energy distribution at constant ion flux and constant mean ion energy with tailored voltage waveforms
B Bruneau, T Lafleur, JP Booth, E Johnson
Plasma Sources Science and Technology 25 (2), 025006, 2016
222016
Slope and amplitude asymmetry effects on low frequency capacitively coupled carbon tetrafluoride plasmas
B Bruneau, I Korolov, T Lafleur, T Gans, D O'Connell, A Greb, A Derzsi, ...
Journal of Applied Physics 119 (16), 2016
212016
Understanding the amorphous-to-microcrystalline silicon transition in SiF4/H2/Ar gas mixtures
JC Dornstetter, B Bruneau, P Bulkin, EV Johnson, P Roca i Cabarrocas
The Journal of Chemical Physics 140 (23), 2014
212014
Ion energy threshold in low-temperature silicon epitaxy for thin-film crystalline photovoltaics
B Bruneau, R Cariou, JC Dornstetter, M Lepecq, JL Maurice, ...
IEEE Journal of photovoltaics 4 (6), 1361-1367, 2014
202014
Effect of ion energy on microcrystalline silicon material and devices: a study using tailored voltage waveforms
B Bruneau, M Lepecq, J Wang, JC Dornstetter, JL Maurice, EV Johnson
IEEE Journal of Photovoltaics 4 (6), 1354-1360, 2014
182014
Experimental benchmark of kinetic simulations of capacitively coupled plasmas in molecular gases
Z Donkó, A Derzsi, I Korolov, P Hartmann, S Brandt, J Schulze, B Berger, ...
Plasma Physics and Controlled Fusion 60 (1), 014010, 2018
162018
Material and growth mechanism studies of microcrystalline silicon deposited from SiF4/H2/Ar gas mixtures
JC Dornstetter, J Wang, B Bruneau, EV Johnson, P Roca i Cabarrocas
Canadian Journal of Physics 92 (7/8), 740-743, 2014
162014
Capacitively coupled hydrogen plasmas sustained by tailored voltage waveforms: excitation dynamics and ion flux asymmetry
B Bruneau, P Diomede, DJ Economou, S Longo, T Gans, D O’Connell, ...
Plasma Sources Science and Technology 25 (4), 045019, 2016
152016
Excitation of Ar, O2, and SF6/O2 plasma discharges using tailored voltage waveforms: control of surface ion bombardment energy and determination of the dominant electron …
G Fischer, K Ouaras, E Drahi, B Bruneau, EV Johnson
Plasma Sources Science and Technology 27 (7), 074003, 2018
102018
Capacitively coupled hydrogen plasmas sustained by tailored voltage waveforms: vibrational kinetics and negative ions control
P Diomede, B Bruneau, S Longo, E Johnson, JP Booth
Plasma Sources Science and Technology 26 (7), 075007, 2017
92017
Maskless and contactless patterned silicon deposition using a localized PECVD process
R Leal, B Bruneau, P Bulkin, T Novikova, F Silva, N Habka, EV Johnson
Plasma Sources Science and Technology 29 (2), 025023, 2020
72020
Maskless interdigitated a-Si: H PECVD process on full M0 c-Si wafer: Homogeneity and passivation assessment
K Ouaras, S Filonovich, B Bruneau, J Wang, M Ghosh, E Johnson
Solar Energy Materials and Solar Cells 246, 111927, 2022
42022
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