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Djelloul Mendil
Djelloul Mendil
Unité de recherche en optique et photonique, centre de développement des technologies avancées
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Effect of RF sputtering power and vacuum annealing on the properties of AZO thin films prepared from ceramic target in confocal configuration
F Challali, D Mendil, T Touam, T Chauveau, V Bockelée, AG Sanchez, ...
Materials Science in Semiconductor Processing 118, 105217, 2020
502020
Influence of growth time and substrate type on the microstructure and luminescence properties of ZnO thin films deposited by RF sputtering
D Mendil, F Challali, T Touam, A Chelouche, AH Souici, S Ouhenia, ...
Journal of Luminescence 215, 116631, 2019
402019
Preparation of RF sputtered AZO/Cu/AZO multilayer films and the investigation of Cu thickness and substrate effects on their microstructural and optoelectronic properties
D Mendil, F Challali, T Touam, V Bockelee, S Ouhenia, A Souici, ...
Journal of Alloys and Compounds 860, 158470, 2021
282021
Role of substrate and annealing on microstructural, optoelectronic and luminescence properties of RF magnetron sputtered AZO thin films in confocal configuration
M Mohamedi, F Challali, T Touam, D Mendil, S Ouhenia, AH Souici, ...
Journal of Luminescence 244, 118739, 2022
92022
Growth of AZO/Cu/AZO multilayer structures by confocal RF magnetron sputtering and their microstructural and optoelectronic properties before and after annealing
D Mendil, F Challali, T Touam, S Ouhenia, M Boudaa, A Souici, D Djouadi, ...
Materials Science and Engineering: B 284, 115889, 2022
82022
ZnO nanorods prepared by ultrasonic spray pyrolysis: effect of deposition time on the structural morphological and optical properties
F Ynineb, DE Guitoume, D Mendil, N Attaf, MS Aida, H Farh
Defect and Diffusion Forum 397, 88-100, 2019
52019
Spatial Evolution Study of EEDFs and Plasma Parameters in RF Stochastic Regime by Langmuir Probe
D Mendil, H Lahmar, L Boufendi
Plasma Science and Technology 16 (9), 837, 2014
52014
Ag thickness and substrate effects on microstructural and optoelectronic properties of AZO/Ag/AZO multilayer structures deposited by confocal RF magnetron sputtering
M Mohamedi, F Challali, T Touam, M Konstantakopoulou, V Bockelée, ...
Applied Physics A 129 (8), 545, 2023
42023
ZnO thin films grown by plasma sputtering process for optoelectronic applications: Effect of substrate type
D Mendil, F Challali, T Touam, A Chelouche, D Djouadi
Proceedings of the 4th International Symposium on Materials and Sustainable …, 2020
42020
Development of a Radiofrequency Plasma Diagnostic System with a Langmuir Probe and Study of a Capacitively Coupled Argon Plasma
D Mendil, H Lahmar, D Ouadjaout, L Henni, L Boufendi, D Louhibi, ...
Advanced Materials Research 227, 204-207, 2011
22011
Kinetic Monte Carlo simulation of self-organized growth of silver nanoparticles in a TiO2 matrix
A Bouhadiche, S Benghorieb, T Touam, D Mendil, A Chelouche
Journal of Crystal Growth 556, 125992, 2021
12021
Growth of ZnO Nanorods by Template-Free Sol-Gel Dip-Coating Technique: Effect of Pre-Annealing Temperature
DE Guitoume, F Ynineb, D Mendil, H Farh, N Attaf, MS Aida
Defect and Diffusion Forum 397, 111-117, 2019
2019
Mise au point d'un système de diagnostic des décharges RF basse préssion par sonde de langmuir
D Mendil
Alger, 2011
2011
Study of spacial evolution of EEDFs and plasma parameters in RF-CCP argon stochastic mode discharge by Langmuir probe
D Mendil, H Lahmar, L Boufendi, D Ouadjaout, L Henni, D Louhibi, ...
INVESTIGATION OF EEDF AND ELECTRON DENSITY AND TEMPERATURE BY DEVELOPED LANGMUIR PROBE IN RF-CCP ARGON DISCHARGE AND CORRELATION WITH OES
D MENDIL, H LAHMAR, L HENNI, M ALIM, D LOUHIBI, K HENDA
AND TEMPERATURE BY DEVELOPED LANGMUIR PROBE IN RF-CCP ARGON DISCHARGE AND CORRELATION WITH OES
D MENDIL, H LAHMAR, L HENNI, M ALIM, D LOUHIBI, K HENDA
Energy (eV) 10 (30), 40-50, 0
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Artículos 1–16